研究离焦电子束重叠比对电镜相位重构质量的影响。
On Overlap Ratio in Defocused Electron Ptychography
- 定义两个与样品和算法无关的重叠比相关量
- 重叠比≥40%时重建结果稳定且高质量
- 适合材料与生物电镜相位重构研究者参考
采用离焦电子束的四维扫描透射电镜（4D STEM）是一种通过相位恢复过程——电子菊晶术（Electron Ptychography, EP）来表征复杂生物样品和材料的有前景技术。4D STEM采集效果及EP重建质量取决于相邻照射区域的重叠比。本文展示了重叠比对数据冗余度和EP重建质量的影响。我们定义了两个关于重叠比的量，其值与样品及EP算法无关。随后，使用模拟的4D STEM数据集评估了不同重叠比下的EP算法性能。值得注意的是，当重叠比达到或超过40%时，可获得稳定且高质量的重建结果。
原文摘要 · Abstract (English)
Four-dimensional Scanning Transmission Electron Microscopy (4D STEM) with data acquired using a defocused electron probe is a promising tool for characterising complex biological specimens and materials through a phase retrieval process known as Electron Ptychography (EP). The efficacy of 4D STEM acquisition and the resulting quality of EP reconstruction depends on the overlap ratio of adjacent illuminated areas. This paper demonstrates how the overlap ratio impacts the data redundancy and the quality of the EP reconstruction. We define two quantities as a function of the overlap ratio that are independent of both the object and the EP algorithm. Subsequently, we evaluate an EP algorithm for varying overlap ratios using simulated 4D STEM datasets. Notably, a 40% or greater overlap ratio yields stable, high-quality reconstructions.
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