探究大脑对称性如何影响MRI修复效果，发现部分结构依赖对侧信息。
Investigating the Role of Bilateral Symmetry for Inpainting Brain MRI
- 利用扩散模型分析脑部结构修复时对侧区域的依赖程度
- 部分皮下结构修复结果受对侧对称性影响显著，强度与面积变化明显
- 适用于研究脑成像建模中对称性机制的医学影像学者
图像修复技术在脑部MRI分析中展现出重要价值，尤其在异常检测任务中。本文研究修复过程中个体特异性条件信息（即被遮挡区域）与修复结果之间的统计关系，特别关注遮挡对侧结构的影响。通过分析扩散修复模型在子皮层结构上的修复表现，考察其灰度值和估计面积的变化，发现部分脑区的修复高度依赖对侧对称性信息。实验揭示了对称性在模型推理中的关键作用，有助于理解模型从何处获取修复依据。
原文摘要 · Abstract (English)
Inpainting has recently emerged as a valuable and interesting technology to employ in the analysis of medical imaging data, in particular brain MRI. A wide variety of methodologies for inpainting MRI have been proposed and demonstrated on tasks including anomaly detection. In this work we investigate the statistical relationship between inpainted brain structures and the amount of subject-specific conditioning information, i.e. the other areas of the image that are masked. In particular, we analyse the distribution of inpainting results when masking additional regions of the image, specifically the contra-lateral structure. This allows us to elucidate where in the brain the model is drawing information from, and in particular, what is the importance of hemispherical symmetry? Our experiments interrogate a diffusion inpainting model through analysing the inpainting of subcortical brain structures based on intensity and estimated area change. We demonstrate that some structures show a strong influence of symmetry in the conditioning of the inpainting process.
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