提出一种高效灵活的图像水印框架,支持全局与局部水印嵌入提取。
Mask Image Watermarking
- 通过解码阶段的简单掩码机制,实现全局与局部水印提取。
- 在多个任务上超越现有模型,且水印图像视觉质量高。
- 训练仅需20小时,可快速适配不同鲁棒性需求,适合实际部署。
我们提出MaskWM,一种简单、高效且灵活的图像水印框架。该框架包含两个变体:(1) MaskWM-D,支持全局水印嵌入、水印定位和局部水印提取,适用于篡改检测;(2) MaskWM-ED,专注于局部水印嵌入与提取,在小区域攻击下具有更强鲁棒性,支持细粒度图像保护。MaskWM-D基于经典的编码器-畸变层-解码器训练范式,在解码阶段引入简单掩码机制,使解码器能同时实现全局与局部水印提取。训练时,通过在提取前对含水印图像施加多种掩码,引导解码器学习水印定位与局部提取能力。MaskWM-ED进一步将掩码引入编码阶段,引导编码器将水印嵌入指定局部区域,提升区域攻击下的鲁棒性。大量实验表明,MaskWM在全局与局部水印提取、水印定位及多水印嵌入任务上均达到当前最佳性能,显著优于所有现有基线模型,包括最新领先的局部水印模型WAM。同时,其保持了高质量的水印图像视觉效果。此外,MaskWM计算效率极高,仅需单块A6000 GPU训练20小时,比WAM快15倍。只需调整畸变层,即可快速微调以满足不同鲁棒性需求。
原文摘要 · Abstract (English)
We present MaskWM, a simple, efficient, and flexible framework for image watermarking. MaskWM has two variants: (1) MaskWM-D, which supports global watermark embedding, watermark localization, and local watermark extraction for applications such as tamper detection; (2) MaskWM-ED, which focuses on local watermark embedding and extraction, offering enhanced robustness in small regions to support fine-grined image protection. MaskWM-D builds on the classical encoder-distortion layer-decoder training paradigm. In MaskWM-D, we introduce a simple masking mechanism during the decoding stage that enables both global and local watermark extraction. During training, the decoder is guided by various types of masks applied to watermarked images before extraction, helping it learn to localize watermarks and extract them from the corresponding local areas. MaskWM-ED extends this design by incorporating the mask into the encoding stage as well, guiding the encoder to embed the watermark in designated local regions, which improves robustness under regional attacks. Extensive experiments show that MaskWM achieves state-of-the-art performance in global and local watermark extraction, watermark localization, and multi-watermark embedding. It outperforms all existing baselines, including the recent leading model WAM for local watermarking, while preserving high visual quality of the watermarked images. In addition, MaskWM is highly efficient and adaptable. It requires only 20 hours of training on a single A6000 GPU, achieving 15x computational efficiency compared to WAM. By simply adjusting the distortion layer, MaskWM can be quickly fine-tuned to meet varying robustness requirements.
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