arXiv:2508.14053cs.ARcs.AI2025-08被引 3

用多智能体LLM实现分层芯片设计,提升真实芯片模块生成准确率。

MAHL: Multi-Agent LLM-Guided Hierarchical Chiplet Design with Adaptive Debugging

  • 六智能体协作分层生成芯片设计,融合检索增强与多粒度探索
  • 真实芯片设计生成准确率(Pass@5)从0提升至0.72
  • 适合需要高效硬件优化的AI芯片研发团队

随着程序工作负载(如AI)规模和算法复杂度增加,其高维性体现在计算核心、阵列尺寸和内存层次结构上。为应对挑战,需创新方法。敏捷芯片设计已通过机器学习在逻辑综合、布局和布线等阶段获益。近期大语言模型(LLM)在硬件描述语言(HDL)生成方面表现优异,有望扩展至2.5D集成技术,该技术可节省面积开销和开发成本。然而,基于LLM的芯片小片设计面临扁平化设计、验证成本高和参数优化不精准等问题,限制了其设计能力。为此,我们提出MAHL,一种分层式LLM驱动的芯片小片设计生成框架,包含六个智能体,协同完成人工智能算法-硬件映射,包括分层描述生成、检索增强代码生成、基于多样性流的验证以及多粒度设计空间探索。这些组件共同提升了芯片设计的高效生成与优化的功耗、性能、面积(PPA)。实验表明,MAHL不仅显著提高简单RTL设计的生成准确率,还使真实芯片小片设计的生成准确率(以Pass@5评估)从0提升至0.72,优于传统LLM;相比最先进方法CLARIE(专家依赖型),在特定优化目标下达到相当或更优的PPA结果。

原文摘要 · Abstract (English)

As program workloads (e.g., AI) increase in size and algorithmic complexity, the primary challenge lies in their high dimensionality, encompassing computing cores, array sizes, and memory hierarchies. To overcome these obstacles, innovative approaches are required. Agile chip design has already benefited from machine learning integration at various stages, including logic synthesis, placement, and routing. With Large Language Models (LLMs) recently demonstrating impressive proficiency in Hardware Description Language (HDL) generation, it is promising to extend their abilities to 2.5D integration, an advanced technique that saves area overhead and development costs. However, LLM-driven chiplet design faces challenges such as flatten design, high validation cost and imprecise parameter optimization, which limit its chiplet design capability. To address this, we propose MAHL, a hierarchical LLM-based chiplet design generation framework that features six agents which collaboratively enable AI algorithm-hardware mapping, including hierarchical description generation, retrieval-augmented code generation, diverseflow-based validation, and multi-granularity design space exploration. These components together enhance the efficient generation of chiplet design with optimized Power, Performance and Area (PPA). Experiments show that MAHL not only significantly improves the generation accuracy of simple RTL design, but also increases the generation accuracy of real-world chiplet design, evaluated by Pass@5, from 0 to 0.72 compared to conventional LLMs under the best-case scenario. Compared to state-of-the-art CLARIE (expert-based), MAHL achieves comparable or even superior PPA results under certain optimization objectives.

芯片设计LLM多智能体2.5D集成

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