arXiv:2509.25510cs.LGcs.AR2025-09被引 15

用大模型自动完成模拟电路晶体管尺寸设计,减少人工干预。

EEsizer: LLM-Based AI Agent for Sizing of Analog and Mixed Signal Circuit

  • 结合大模型与电路仿真器,实现闭环自动调参。
  • 在90nm节点上仅用20次迭代即达成目标性能,表现稳定。
  • 适合芯片设计工程师快速验证电路方案,尤其适用于先进制程。

模拟与混合信号(AMS)集成电路的设计通常依赖大量手动操作,尤其是在晶体管尺寸调整阶段。尽管电子设计自动化(EDA)中的机器学习方法已展现出降低复杂性和减少人工干预的潜力,但仍面临迭代次数多、缺乏领域知识等问题。近年来,大语言模型(LLMs)在多个领域表现出显著能力,显示出一定的电路设计知识,具备自动化晶体管尺寸调整的潜力。本文提出EEsizer,一个基于大模型的AI代理,将大语言模型与电路仿真器及自定义数据分析功能集成,实现无需外部知识支持的全自动化闭环晶体管尺寸优化。通过提示工程和思维链推理,该代理可迭代探索设计方向、评估性能并精炼方案,几乎无需人工介入。我们首先在6个基础电路上对8个LLM进行了基准测试,并选取3个表现优异的模型用于优化一个20晶体管的CMOS运算放大器,目标涵盖从180 nm到90 nm工艺节点的轨到轨工作性能。值得注意的是,OpenAI o3在三个不同测试组中均成功实现用户设定目标,最多仅需20次迭代,展现了在先进节点下的适应性与鲁棒性。为评估设计稳健性,我们手动设计了一个偏置电路,并采用高斯分布对晶体管尺寸和阈值电压进行变化分析。

原文摘要 · Abstract (English)

The design of Analog and Mixed-Signal (AMS) integrated circuits (ICs) often involves significant manual effort, especially during the transistor sizing process. While Machine Learning techniques in Electronic Design Automation (EDA) have shown promise in reducing complexity and minimizing human intervention, they still face challenges such as numerous iterations and a lack of knowledge about AMS circuit design. Recently, Large Language Models (LLMs) have demonstrated significant potential across various fields, showing a certain level of knowledge in circuit design and indicating their potential to automate the transistor sizing process. In this work, we propose EEsizer, an LLM-based AI agent that integrates large language models with circuit simulators and custom data analysis functions, enabling fully automated, closed-loop transistor sizing without relying on external knowledge. By employing prompt engineering and Chain-of-Thought reasoning, the agent iteratively explores design directions, evaluates performance, and refines solutions with minimal human intervention. We first benchmarked 8 LLMs on six basic circuits and selected three high-performing models to optimize a 20-transistor CMOS operational amplifier, targeting multiple performance metrics, including rail-to-rail operation from 180 nm to 90 nm technology nodes. Notably, OpenAI o3 successfully achieved the user-intended target at 90 nm across three different test groups, with a maximum of 20 iterations, demonstrating adaptability and robustness at advanced nodes. To assess design robustness, we manually designed a bias circuit and performed a variation analysis using Gaussian-distributed variations on transistor dimensions and threshold voltages.

电路设计大模型自动化芯片

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