开源软件实现微米级位姿估计，突破纳米精度极限。
VERNIER: an open-source software pushing marker pose estimation down to the micrometer and nanometer scales
- 基于伪周期图案的相位处理算法，实现高精度位姿测量。
- 在厘米量级范围内达到纳米级分辨率与微弧度级精度。
- 对噪声、离焦和遮挡鲁棒，适合显微成像等精密场景。
在微小尺度下，位姿估计仍具挑战性。现有方法难以在较大范围上实现纳米级分辨率与微弧度级6自由度测量。本文提出VERNIER——一款开源相位处理软件，通过伪周期图案实现快速可靠的位姿测量。其核心为相位基局部阈值算法，在噪声、离焦和遮挡条件下表现稳健。文中详述相位处理流程及多种适配不同应用需求的图案设计，并以合成与实验图像演示实现过程。最后给出依据目标性能选择图案设计与显微镜放大倍数的指导建议。
原文摘要 · Abstract (English)
Pose estimation is still a challenge at the small scales. Few solutions exist to capture the 6 degrees of freedom of an object with nanometric and microradians resolutions over relatively large ranges. Over the years, we have proposed several fiducial marker and pattern designs to achieve reliable performance for various microscopy applications. Centimeter ranges are possible using pattern encoding methods, while nanometer resolutions can be achieved using phase processing of the periodic frames. This paper presents VERNIER, an open source phase processing software designed to provide fast and reliable pose measurement based on pseudo-periodic patterns. Thanks to a phase-based local thresholding algorithm, the software has proven to be particularly robust to noise, defocus and occlusion. The successive steps of the phase processing are presented, as well as the different types of patterns that address different application needs. The implementation procedure is illustrated with synthetic and experimental images. Finally, guidelines are given for selecting the appropriate pattern design and microscope magnification lenses as a function of the desired performance.
Thank you to arXiv for use of its open access interoperability. PaperDance 不是 arXiv 官方产品；中文卡片由大模型生成，请以原文为准。