统一框架解决光刻制图中的三大难题，提升芯片设计效率
Unitho: A Unified Multi-Task Framework for Computational Lithography
- 基于Transformer的统一多任务模型，整合制图、仿真与规则检测
- 在数十万工业级数据上训练，性能远超现有学术基准
- 适合芯片制造与EDA智能化研究者快速落地应用
可靠的通用数据基础对计算光刻中大规模模型的构建至关重要。然而，关键任务如掩模生成、规则违规检测和版图优化常被孤立处理，受限于数据稀缺与建模方法有限。为此，我们提出Unitho，一个基于Transformer架构的统一多任务大视觉模型。该模型在包含数十万案例的大规模工业光刻仿真数据集上训练，支持端到端的掩模生成、光刻仿真与规则违规检测。通过实现高效高保真的光刻仿真，Unitho进一步推动智能EDA数据基础的构建。实验验证其有效性和泛化能力，性能显著超越现有学术基线。
原文摘要 · Abstract (English)
Reliable, generalizable data foundations are critical for enabling large-scale models in computational lithography. However, essential tasks-mask generation, rule violation detection, and layout optimization-are often handled in isolation, hindered by scarce datasets and limited modeling approaches. To address these challenges, we introduce Unitho, a unified multi-task large vision model built upon the Transformer architecture. Trained on a large-scale industrial lithography simulation dataset with hundreds of thousands of cases, Unitho supports end-to-end mask generation, lithography simulation, and rule violation detection. By enabling agile and high-fidelity lithography simulation, Unitho further facilitates the construction of robust data foundations for intelligent EDA. Experimental results validate its effectiveness and generalizability, with performance substantially surpassing academic baselines.
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