用无监督图神经网络实现芯片布局的均衡多图案分解,兼顾无冲突与负载均衡。
Unsupervised Graph Neural Network Framework for Balanced Multipatterning in Advanced Electronic Design Automation Layouts
- 将多图案问题转化为带约束的图着色,用无监督GNN生成初始解
- 结合GNN启发式与模拟退火,实现零冲突且各掩模层特征数均衡
- 适用于大规模芯片设计,可复现、低数据依赖,适合工业部署
多图案技术是克服光刻限制的关键布局分解策略。传统启发式回溯和SAT求解器难以同时满足复杂约束与次级目标。本文提出一种混合工作流,将多图案问题建模为带约束的图着色问题:主目标是最小化特征违规,次目标是平衡各掩模层的特征数量。流程包含两个核心组件:(1) 无监督训练的GNN代理,生成初始着色预测;(2) 通过GNN启发式与模拟退火进行优化,提升解的质量与均衡性。在私有数据集和开源布局上的实验表明,该方法实现了完全无冲突的分解,并保持一致的颜色平衡。所提框架具备可复现性、数据效率高,可作为EDA中可扩展布局分解的可靠基线。
原文摘要 · Abstract (English)
Multipatterning is an essential decomposition strategy in electronic design automation (EDA) that overcomes lithographic limitations when printing dense circuit layouts. Although heuristic-based backtracking and SAT solvers can address these challenges, they often struggle to simultaneously handle both complex constraints and secondary objectives. In this study, we present a hybrid workflow that casts multipatterning as a variant of a constrained graph coloring problem with the primary objective of minimizing feature violations and a secondary objective of balancing the number of features on each mask. Our pipeline integrates two main components: (1) A GNN-based agent, trained in an unsupervised manner to generate initial color predictions, which are refined by (2) refinement strategies (a GNN-based heuristic and simulated annealing) that together enhance solution quality and balance. Experimental evaluation in both proprietary data sets and publicly available open source layouts demonstrate complete conflict-free decomposition and consistent color balancing. The proposed framework provides a reproducible, data-efficient and deployable baseline for scalable layout decomposition in EDA workflows.
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