让手绘稿能按指令精准修改局部,同时保持整体风格一致。
SketchAssist: A Practical Assistant for Semantic Edits and Precise Local Redrawing
- 用指令+线条双重引导,统一控制语义改动和局部重绘。
- 在多步编辑中保持结构对齐,支持多种绘画风格迁移。
- 适合需要精细调整草图的设计师、艺术家或交互创作用户。
手绘稿编辑需同时处理高层语义变化与精细局部重绘,这对稀疏、风格敏感的线稿尤为困难。与自然图像不同,手绘稿依赖极少视觉线索,现有方法难以兼顾全局语义修改与细粒度结构控制,且易破坏整体一致性。本文提出SketchAssist,一个交互式草图助手,通过指令引导编辑与线稿引导区域重绘的融合,实现高效可控的草图操作并维持整体构图。为此,我们构建了可控制的数据生成流程,生成结构化编辑序列,精确调节属性变化,并在多步修改中保持结构对齐;同时通过风格保持变换扩展样式多样性。基于此数据,SketchAssist采用基于DiT的统一框架,以多通道输入表示草图、掩码与引导信号。为适配不同编辑模式,我们在LoRA层中引入任务引导的专家混合(T-MoE),实现对语义与结构引导的自适应调控。大量实验表明,该方法在两项任务上均达到领先性能,显著提升指令遵循度,以及结构与风格一致性。本方法为草图编辑提供了一种实用且可控的解决方案。
原文摘要 · Abstract (English)
Sketch editing requires jointly handling high-level semantic changes and precise local redrawing, a combination that is particularly challenging for sparse, style-sensitive line art. Unlike natural images, sketches rely on minimal visual cues, making it difficult for existing methods to reconcile global semantic modifications with fine-grained structural control while preserving overall coherence. We present SketchAssist, an interactive sketch assistant that unifies instruction-guided editing with line-guided region redrawing, enabling efficient and controllable sketch manipulation while preserving overall composition. To support this task, we introduce a controllable data generation pipeline that constructs structured edit sequences with precise attribute variations and maintains structural alignment across multi-step modifications, while expanding stylistic diversity via style-preserving transformations. Building on this data, SketchAssist adopts a unified framework based on DiT, using a multi-channel input representation to encode sketches, masks, and guidance signals within a single interface. To further handle different editing modes, we integrate a Task-guided Mixture-of-Experts (T-MoE) into LoRA layers, enabling adaptive control over semantic and structural guidance. Extensive experiments demonstrate state-of-the-art performance on both tasks, achieving strong instruction adherence and improved structural and style consistency compared to recent methods. Together, our method provide a practical and controllable solution for sketch editing.
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