构建30万对缺陷数据集,实现无需微调的通用缺陷生成。
Large-Scale Universal Defect Generation: Foundation Models and Datasets
- 采用自适应裁剪与双图输入,融合参考与目标信息生成缺陷。
- 在MVTec-AD和VisA上合成质量优于现有方法,检测准确率提升。
- 适合需要高质量缺陷数据的工业质检、模型训练场景。
现有缺陷生成方法多依赖少样本学习,因缺乏大规模成对缺陷编辑数据,易过拟合特定缺陷类别。缺陷尺度与形态差异大,导致泛化性差、真实感弱、类别一致性低。本文提出UDG,一个包含30万组正常-异常掩码-描述四元组的大规模跨领域数据集;并设计UniDG,一种支持参考图像生成与文本指令编辑的通用缺陷生成基础模型,无需针对每个类别微调。UniDG通过自适应缺陷裁剪与结构化双图输入实现缺陷-上下文编辑,并利用MM-DiT多模态注意力融合参考与目标条件。采用两阶段训练策略:多样性强化微调(Diversity-SFT)后接一致性强化微调(Consistency-RFT),进一步提升多样性、真实感与参考一致性。在MVTec-AD和VisA上的大量实验表明,UniDG在合成质量及单类/多类异常检测与定位任务中均超越先前少样本异常生成与图像插入/编辑基线。代码将开源于https://github.com/RetoFan233/UniDG。
原文摘要 · Abstract (English)
Existing defect/anomaly generation methods often rely on few-shot learning, which overfits to specific defect categories due to the lack of large-scale paired defect editing data. This issue is aggravated by substantial variations in defect scale and morphology, resulting in limited generalization, degraded realism, and category consistency. We address these challenges by introducing UDG, a large-scale dataset of 300K normal-abnormal-mask-caption quadruplets spanning diverse domains, and by presenting UniDG, a universal defect generation foundation model that supports both reference-based defect generation and text instruction-based defect editing without per-category fine-tuning. UniDG performs Defect-Context Editing via adaptive defect cropping and structured diptych input format, and fuses reference and target conditions through MM-DiT multimodal attention. A two-stage training strategy, Diversity-SFT followed by Consistency-RFT, further improves diversity while enhancing realism and reference consistency. Extensive experiments on MVTec-AD and VisA show that UniDG outperforms prior few-shot anomaly generation and image insertion/editing baselines in synthesis quality and downstream single- and multi-class anomaly detection/localization. Code will be available at https://github.com/RetoFan233/UniDG.
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