用强化学习加速光刻掩模生成，提升精度与效率。

In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask. As circuit features shrink below the wavelength of light, optical diffraction causes the printed patterns to deviate from their intended layouts. Inverse Lithography Technology (ILT) addresses this challenge by generating optimized masks that enhance the fidelity of pattern transfer onto wafers. While ILT resembles an image synthesis task, its reliance on explicit physical metrics for mask evaluation limits the applicability of existing generative models. We introduce LithoGRPO, an ILT framework that integrates the flow-matching paradigm with GRPO-based reinforcement learning (RL) fine-tuning, enabling efficient exploration of diverse masks for a given target layout. Unlike purely generative or optimization-based approaches, RL in LithoGRPO exploits the explicitly defined, physics-based reward function of ILT, enabling optimization under complex, process-aware constraints. To the best of our knowledge, this is the first framework that unifies flow matching and RL for mask optimization. To improve RL sampling efficiency, we propose a fast shot-counting algorithm for manufacturability evaluation, achieving over 130x speedup while preserving the mask ranking of the traditional shot-count metric. Extensive experiments demonstrate that LithoGRPO achieves state-of-the-art performance over both optimization-based and learning-based methods, while maintaining efficient mask generation.